EUV, extreme ultraviolet lithography, is nearly completely associated with the Dutch company ASML, the only maker of EUV machines that are used by TSMC, Intel and other chip manufacturers of advanced ...

Scientists have vastly reduced the temperatures and conditions needed to grow special diamonds for computing, making faster ...

Chip manufacturing makes up an outsized part of Taiwan’s economy and contributes 25 percent of the gross domestic product ...

Researchers develop record-breaking solar cells with 2.39V open-circuit voltage, optimized for concentrated photovoltaics ...

They used a process based on plasma etching for cell isolation and singulation, which reportedly enables to manufacture solar cells of any size and shape. As a result, they were able to produce cells ...

Abstract: The formation of cone defects is a side effect of the shallow trench isolation (STI) etching process, caused by the redeposition of residue from silicon nitride, silicon dioxide, or ...

Researchers at the Princeton Plasma Physics Laboratory (PPPL) have made a breakthrough in enhancing the performance of stellarators, a type of fusion device. Fusion, the process that powers the ...

Traditional fusion approaches, like magnetic confinement and inertial confinement, require immense heat to create plasma ... raising the possibility that the process could be used to generate ...

Steps to donate plasma The time needed to do a plasma donation can depend on the visitation. The first time I donated was a longer process than any other time. It took about two and a half hours ...

This is particularly evident in the etching process. What must be a straight, uniform column may be distorted by differing lateral etch rates at different layers, differences in critical dimensions ...