This room also has the following resources: The Trion ICP/RIE Etch PHTII-4301 (TRION) is a reactive ion etcher with the addition of a inductively coupled plasma to achieve a ... before metal ...

RIE is a technique that uses a plasma to selectively remove material from the wafer, allowing for precise control over the etching process. Plasma etching is a similar technique that uses a gas plasma ...

Researchers develop record-breaking solar cells with 2.39V open-circuit voltage, optimized for concentrated photovoltaics ...

Convenience and cost aside, there are a ton of valid reasons to spin up your own boards, ranging from not having to wait for shipping to just wanting to control the process yourself. Whichever ...

The chemical etching process he used is a bit fussy, and prone to undercutting of the mask if the etchant seeps underneath it. As its name implies, RIE uses a plasma of highly reactive ions to do ...

During the fabrication process, we need to etch out the unwanted oxide layer from the wafer, which can be done using plasma etching. Plasma contains high energetic ions and radicals for etching that ...

Through via hole fabrication process by deep reactive-ion etching (DRIE): (a) Sample cleaning; (b) Deposition of mask material; (c) Transfer of desired pattern; (d) Desired pattern achieved; (e) ...

What is Atomic Layer Etching? Atomic layer etching (ALE) is a highly controlled and selective etching technique that removes material layer by layer at the atomic scale. It is a cyclic process that ...

The proposed cell is based on indium gallium phosphide (InGaP), indium gallium arsenide (InGaAs) and germanium (Ge) and has ...

Our products are vacuum-based process tools which interact with materials at the atomic level. Typical material processes include the precision deposition of thin films, remote plasma etching of ...